Sputtering – PLASSYS

Processing
Vacuum-based

Key sample information

Maximum Sample Size: 10×10 cm²
Maximum Sample Height: few cm
Possibility to heat the substrate

Materials available

ITO, Mo, MoNa, SiO2, ZnMgO, ZnO, ZnO:Al

More information about PV material.

Practical information

Manufacturer: Plassys
Model: MP500 / MP600
Minimum training time to use the machine: 3 days

More information our training policy.

What is it for?

This process allows to deposit on every kind of sample various TCO for quick test purpose

Specifications: 3 targets in confocal mode, polarization of the substrate

Possible: ZnO:Al, ZnMgO, SiO2, ITO + others on demand

How does it work?

Sputtering process under vacuum (around 10—3 mbar) and Ar/O2 atmosphere

RF excitation of the electrode

Rotation of the sample for a perfect homogeneity

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