GD-OES – HORIBA

Characterization
Compo/Morpho

Key sample information

Key sample information

Maximum Sample Size: 15×15 cm²
Maximum Sample Height:  1 cm

All types of materials: thin films (semi-conductors), metals, alloys…

 

More information about PV material.

Practical information

Manufacturer: Horiba
Model: Profiler 2 
Tool can be used by everybody providing a training

We have two setups, with one equipped with DIP

More information our training policy.

What is it for?

The direct result from a GDOES analysis is a qualitative composition profile from the surface of the sample towards its inside. It is especially useful to determine the relative amounts of one material (compared to others) at a specific depth or see if compounds/layers have correctly been formed close to layers interfaces. It is consequently also a way to study elemental diffusion inside a material (at least qualitatively). Internal positions of specific layers can be determined with a precision as closer as 10 nm. Quantitative analysis are available after building sets of calibration curves.
Qualitative depth profile
Intensity (u.a.) = f(abrasion time(s))
Quantitative depth profile possible if associated with composition and thickness measurements.
C(%) = f(depth profile (µm))

How does it work?

An Argon (Ar) plasma is formed directly at the surface of the sample. Ar Ions etch the sample and obliterated elements react with the plasma and emit specific light. A precise analysis of the emitted light reveals which atoms have been etched and directly gives the elemental composition of the sample. A comparison with reference curves can be used to measure how much of each element has been etched, and derive the quantitative amounts of every materials. For samples that are not reacting to Ar plasma, one of our 2 setups is equipped with Ar+O2 more powerful plasma (O2 also allows for a variety of chemical reactions that lead to compounds easier to detect during the plasma analysis).

 

Combination of abrasion plasma with photon emission spectroscopy.

Low energy, high flux incident ions give minimum damage to sample.

 

Specifications:

Analysis time: 10 min / sample

Resolution:  10 ppm on metal

Need a direct line?

Feel free to contact us for more information about our offers.

  • +33(0)1 69 86 58 60
  • contact@ipvf.fr
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