
Plasma nanotexturing of silicon: new publication in collaboration with NIST
A new study on plasma nanotexturing of silicon for PV applications has been published in Optics Express – Energy Express. Paper available here: https://doi.org/10.1364/OE.25.0A1057 (open access). This work, in the frame of IPVF project A, is the result of an international collaboration with the LPICM (Laboratory of Physics of Interfaces and Thin Films, CNRS, France) and the Sensor Science Division at NIST (National Institute of Standards and Technology, US). Plasma nanotexturing of silicon leads to